The world has changes dramatically, and Nikon recognizes that technology must do more to serve society and our planet. Our semiconductor lithography and inspection systems bring together the winning combination of over a century of Nikon innovation and the most dedicated employees in the world to deliver the right solutions for our customers.
The inline Alignment Station (iAS) and Litho Booster
iAS is a high speed, pre-measurement module integrated between the coater/developer and NSR-S635E immersions scanners. iAS provides feed forward alignment results for all shots on every wafer. iAS capabilities can be extended to other scanners with the Litho Booster Standalone Alignment Station.
Photomask Technology + Extreme Ultraviolet Lithography 2021
Global forum for engineers and scientists to present and discuss photomask design, fabrication and more. EUVL lithography symposium to facilitate learning across DUV and EUV technologies.